Comparison of Two in Pixel Source Follower Schemes for Deep Subelectron Noise CMOS Image Sensors
This paper compares two in-pixel source follower stage designs for low noise CMOS image sensors embedded both on a same 5 mm by 5 mm chip fabricated in a 180nm CIS process. The presented chip embeds two pixel variants, one based on a body-effect-canceled thin oxide PMOS and the other embeds a native...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2022-01-01
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Series: | IEEE Journal of the Electron Devices Society |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/9863855/ |