Improved reset breakdown strength in a HfOx-based resistive memory by introducing RuOx oxygen diffusion barrier
We investigated the reset breakdown phenomenon of HfOx-based resistive memory for reliable switching operation in a fully CMOS compatible stack. Through the understanding on the effect of electrode materials and device area, our findings show that observed failure is attributed to additional oxygen...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2016-05-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4950966 |