Technological Methods of Forming Thin Semiconductor Layers. Part 2
Features and basic technological methods of formation of thin layers of semiconductor materials in a vacuum with the method of thermal spraying in a quasi-closed volume are analyzed. The disadvantages of thermal spraying of thin films of multicomponent semiconductor compounds in an open vacuum are i...
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| Format: | Article |
| Language: | English |
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Stepan Gzhytskyi National University of Veterinary Medicine and Biotechnologies Lviv
2019-11-01
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| Series: | Науковий вісник Львівського національного університету ветеринарної медицини та біотехнологій імені С.З. Ґжицького. Серія: Харчові технології |
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| Online Access: | https://nvlvet.com.ua/index.php/food/article/view/3821 |