Recent development of new inductively coupled thermal plasmas for materials processing

Recent development of new inductively coupled thermal plasmas for materials processing

This paper explains recent developments in the field of inductively coupled thermal plasmas (ICTP or ITP) used for materials processing. Inductive coupling technique is important to produce thermal plasma with high gas temperature at high pressures. Conventional cylindrical ICTP was developed origin...

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Bibliographic Details
Main Author: Yasunori Tanaka
Format: Article
Language:English
Published: Taylor & Francis Group 2021-01-01
Series:Advances in Physics: X
Subjects:
inductively coupled thermal plasma
pulse modulation
nanoparticle synthesis
icp
surface modification
Online Access:http://dx.doi.org/10.1080/23746149.2020.1867637

Internet

http://dx.doi.org/10.1080/23746149.2020.1867637

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