Recent development of new inductively coupled thermal plasmas for materials processing
This paper explains recent developments in the field of inductively coupled thermal plasmas (ICTP or ITP) used for materials processing. Inductive coupling technique is important to produce thermal plasma with high gas temperature at high pressures. Conventional cylindrical ICTP was developed origin...
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| Format: | Article |
| Language: | English |
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Taylor & Francis Group
2021-01-01
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| Series: | Advances in Physics: X |
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| Online Access: | http://dx.doi.org/10.1080/23746149.2020.1867637 |