Spectroscopic Properties of Si-nc in SiO<sub>x</sub> Films Using HFCVD
In the present work, non-stoichiometric silicon oxide films (SiO<sub>x</sub>) deposited using a hot filament chemical vapor deposition technique at short time and simple parameters of depositions are reported. This is motivated by the numerous potential applications of SiO<sub>x<...
| Main Authors: | , , , , , , , , |
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| 格式: | 文件 |
| 语言: | English |
| 出版: |
MDPI AG
2020-07-01
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| 丛编: | Nanomaterials |
| 主题: | |
| 在线阅读: | https://www.mdpi.com/2079-4991/10/7/1415 |