Stochastic antireflection structures on silicon fabricated by reactive ion etching
Stochastic Si nanostructures for antireflection (AR) fabricated by reactive ion etching (RIE) are presented for use in different spectral ranges. The lithography-free fabrication enables its application on highly curved surfaces. ALD-coatings of Al2O3 of varying thickness can improve the mechanical...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2023-01-01
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| Series: | EPJ Web of Conferences |
| Online Access: | https://www.epj-conferences.org/articles/epjconf/pdf/2023/13/epjconf_eosam2023_05026.pdf |