Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion...

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Bibliographic Details
Main Authors: B Graczykowski, J Gomis-Bresco, F Alzina, J S Reparaz, A Shchepetov, M Prunnila, J Ahopelto, C M Sotomayor Torres
Format: Article
Language:English
Published: IOP Publishing 2014-01-01
Series:New Journal of Physics
Subjects:
acoustic phonons
ultra-thin Si membranes
Brillouin light scattering
43.35.Pt
78.35.+c
85.85.+j
Online Access:https://doi.org/10.1088/1367-2630/16/7/073024

Internet

https://doi.org/10.1088/1367-2630/16/7/073024

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