Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field
We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion...
Main Authors: | , , , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
IOP Publishing
2014-01-01
|
Series: | New Journal of Physics |
Subjects: | |
Online Access: | https://doi.org/10.1088/1367-2630/16/7/073024 |
_version_ | 1797751387996553216 |
---|---|
author | B Graczykowski J Gomis-Bresco F Alzina J S Reparaz A Shchepetov M Prunnila J Ahopelto C M Sotomayor Torres |
author_facet | B Graczykowski J Gomis-Bresco F Alzina J S Reparaz A Shchepetov M Prunnila J Ahopelto C M Sotomayor Torres |
author_sort | B Graczykowski |
collection | DOAJ |
description | We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations. |
first_indexed | 2024-03-12T16:47:46Z |
format | Article |
id | doaj.art-97f4e0c3d46e44109d3b5ddc73309987 |
institution | Directory Open Access Journal |
issn | 1367-2630 |
language | English |
last_indexed | 2024-03-12T16:47:46Z |
publishDate | 2014-01-01 |
publisher | IOP Publishing |
record_format | Article |
series | New Journal of Physics |
spelling | doaj.art-97f4e0c3d46e44109d3b5ddc733099872023-08-08T11:30:08ZengIOP PublishingNew Journal of Physics1367-26302014-01-0116707302410.1088/1367-2630/16/7/073024Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress fieldB Graczykowski0J Gomis-Bresco1F Alzina2J S Reparaz3A Shchepetov4M Prunnila5J Ahopelto6C M Sotomayor Torres7ICN2—Institut Catala de Nanociencia i Nanotecnologia , Campus UAB, E-08193 Bellaterra (Barcelona), SpainICN2—Institut Catala de Nanociencia i Nanotecnologia , Campus UAB, E-08193 Bellaterra (Barcelona), SpainICN2—Institut Catala de Nanociencia i Nanotecnologia , Campus UAB, E-08193 Bellaterra (Barcelona), SpainICN2—Institut Catala de Nanociencia i Nanotecnologia , Campus UAB, E-08193 Bellaterra (Barcelona), SpainVTT Technical Research Centre of Finland , PO Box 1000, FI-02044 VTT, Espoo, FinlandVTT Technical Research Centre of Finland , PO Box 1000, FI-02044 VTT, Espoo, FinlandVTT Technical Research Centre of Finland , PO Box 1000, FI-02044 VTT, Espoo, FinlandICN2—Institut Catala de Nanociencia i Nanotecnologia , Campus UAB, E-08193 Bellaterra (Barcelona), Spain; ICREA-Institucio Catalana de Recerca i Estudis Avançats , E-08010 Barcelona, SpainWe report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.https://doi.org/10.1088/1367-2630/16/7/073024acoustic phononsultra-thin Si membranesBrillouin light scattering43.35.Pt78.35.+c85.85.+j |
spellingShingle | B Graczykowski J Gomis-Bresco F Alzina J S Reparaz A Shchepetov M Prunnila J Ahopelto C M Sotomayor Torres Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field New Journal of Physics acoustic phonons ultra-thin Si membranes Brillouin light scattering 43.35.Pt 78.35.+c 85.85.+j |
title | Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field |
title_full | Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field |
title_fullStr | Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field |
title_full_unstemmed | Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field |
title_short | Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field |
title_sort | acoustic phonon propagation in ultra thin si membranes under biaxial stress field |
topic | acoustic phonons ultra-thin Si membranes Brillouin light scattering 43.35.Pt 78.35.+c 85.85.+j |
url | https://doi.org/10.1088/1367-2630/16/7/073024 |
work_keys_str_mv | AT bgraczykowski acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT jgomisbresco acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT falzina acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT jsreparaz acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT ashchepetov acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT mprunnila acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT jahopelto acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield AT cmsotomayortorres acousticphononpropagationinultrathinsimembranesunderbiaxialstressfield |