Investigation of NiO film by sparking method under a magnetic field and NiO/ZnO heterojunction

Investigation of NiO film by sparking method under a magnetic field and NiO/ZnO heterojunction

Nickel oxide (NiO) film receives attention from the field of optoelectronics due to its wide band gap and high transparency. By using a sparking method, the deposition of the NiO film is facile and unique. However, the NiO film made by the sparking method indicates a porous surface with an agglomera...

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Bibliographic Details
Main Authors: Posak Tippo, Wiradej Thongsuwan, Orawan Wiranwetchayan, Tewasin Kumpika, Adisorn Tuantranont, Pisith Singjai
Format: Article
Language:English
Published: IOP Publishing 2020-01-01
Series:Materials Research Express
Subjects:
magnetic field
optoelectronics
spark discharge
semiconductor
heterojunction
nickel oxide
Online Access:https://doi.org/10.1088/2053-1591/ab8df6

Internet

https://doi.org/10.1088/2053-1591/ab8df6

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