Ultrathin MoS₂-Channel FeFET Memory With Enhanced Ferroelectricity in HfZrO₂ and Body-Potential Control

We have experimentally demonstrated memory operation of a HfO<sub>2</sub>-based ferroelectric FET (FeFET) with an ultrathin MoS<sub>2</sub> channel and bottom-gate structure. ZrO<sub>2</sub> seed layer enhances ferroelectricity in HfZrO<sub>2</sub> by...

Full description

Bibliographic Details
Main Authors: Jiawen Xiang, Wen Hsin Chang, Takuya Saraya, Toshiro Hiramoto, Toshifumi Irisawa, Masaharu Kobayashi
Format: Article
Language:English
Published: IEEE 2022-01-01
Series:IEEE Journal of the Electron Devices Society
Subjects:
Online Access:https://ieeexplore.ieee.org/document/9642045/