Reliability assessment of high-power GaN-HEMT devices with different buffers under influence of gate bias and high-temperature tests

This study compares Vth-instability in D-mode MIS-HEMT devices between two epitaxial layers, AlN/AlGaN/GaN superlattice-W1, and three-step graded AlGaN-W2. Experimental results demonstrate that W1 exhibits ∼13% less Vth-instability compared to W2, with distinct degradation regions at specific voltag...

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Bibliographic Details
Main Authors: Shivendra K. Rathaur, Le Trung Hieu, Abhisek Dixit, Edward Yi Chang
Format: Article
Language:English
Published: IOP Publishing 2024-01-01
Series:Applied Physics Express
Subjects:
Online Access:https://doi.org/10.35848/1882-0786/ad56f8