Nanopillar and nanohole fabrication via mixed lithography

Nanopillar and nanohole fabrication via mixed lithography

We report a fabrication method for the production of nanopillar (NP) or nanohole (NH) arrays together with a micrometer-sized structure within a single layer. On a 200 mm silicon wafer, we produced 200–400 nm NP or NH arrays using electron beam lithography (EBL). The EBL patterns on a positive-tone...

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Bibliographic Details
Main Authors: Seung Hee Baek, Sunwoong Lee, Ju-Hyun Bae, Chang-Won Hong, Mae-Ja Park, Hongsik Park, Moon-Chang Baek, Sung-Wook Nam
Format: Article
Language:English
Published: IOP Publishing 2020-01-01
Series:Materials Research Express
Subjects:
electron beam lithography
nanopillar
nanohole
Online Access:https://doi.org/10.1088/2053-1591/ab77ed

Internet

https://doi.org/10.1088/2053-1591/ab77ed

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