APA (7th ed.) Citation

Wang, D. D., Wang, W. L., Huang, M. Y., Lek, A., Lam, J., & Mai, Z. H. (2014). Failure mechanism analysis and process improvement on time-dependent dielectric breakdown of Cu/ultra-low-k dielectric based on complementary Raman and FTIR spectroscopy study. AIP Publishing LLC.

Chicago Style (17th ed.) Citation

Wang, Dan Dan, Wei Lin Wang, Maggie Yamin Huang, Alan Lek, Jeffrey Lam, and Zhi Hong Mai. Failure Mechanism Analysis and Process Improvement on Time-dependent Dielectric Breakdown of Cu/ultra-low-k Dielectric Based on Complementary Raman and FTIR Spectroscopy Study. AIP Publishing LLC, 2014.

MLA (9th ed.) Citation

Wang, Dan Dan, et al. Failure Mechanism Analysis and Process Improvement on Time-dependent Dielectric Breakdown of Cu/ultra-low-k Dielectric Based on Complementary Raman and FTIR Spectroscopy Study. AIP Publishing LLC, 2014.