Atomic layer deposition of functional multicomponent oxides
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flou...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2019-11-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.5113656 |