Atomic layer deposition of functional multicomponent oxides
Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flou...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2019-11-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.5113656 |
| _version_ | 1819156039895875584 |
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| author | Mariona Coll Mari Napari |
| author_facet | Mariona Coll Mari Napari |
| author_sort | Mariona Coll |
| collection | DOAJ |
| description | Advances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flourished over the last decades in fabrication of conformal thin films and nanostructures with atomic-scale control. Nonetheless, the scenario of deposition of complex oxides with desired properties has proven to be challenging. In this article, we scrutinize the basics of the precursor and process design for ALD followed by a review on the major achievements in the synthesis of doped and complex oxides identifying several relevant examples that are foreseen to have direct technological applications. Finally, current challenges and perspectives on ALD complex oxides are given. |
| first_indexed | 2024-12-22T15:46:32Z |
| format | Article |
| id | doaj.art-997df4a559f64d688dbab1005b98c26c |
| institution | Directory Open Access Journal |
| issn | 2166-532X |
| language | English |
| last_indexed | 2024-12-22T15:46:32Z |
| publishDate | 2019-11-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | APL Materials |
| spelling | doaj.art-997df4a559f64d688dbab1005b98c26c2022-12-21T18:21:01ZengAIP Publishing LLCAPL Materials2166-532X2019-11-01711110901110901-1510.1063/1.5113656Atomic layer deposition of functional multicomponent oxidesMariona Coll0Mari Napari1Institut de Ciència de Materials de Barcelona ICMAB-CSIC, Campus UAB, 08193 Bellaterra, SpainDepartment of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United KingdomAdvances in the fabrication of multicomponent oxide thin films are crucial to prepare specific compositions with precise structures and controlled interfaces. This will enable the investigation of novel phenomena and development of new devices and applications. Atomic layer deposition (ALD) has flourished over the last decades in fabrication of conformal thin films and nanostructures with atomic-scale control. Nonetheless, the scenario of deposition of complex oxides with desired properties has proven to be challenging. In this article, we scrutinize the basics of the precursor and process design for ALD followed by a review on the major achievements in the synthesis of doped and complex oxides identifying several relevant examples that are foreseen to have direct technological applications. Finally, current challenges and perspectives on ALD complex oxides are given.http://dx.doi.org/10.1063/1.5113656 |
| spellingShingle | Mariona Coll Mari Napari Atomic layer deposition of functional multicomponent oxides APL Materials |
| title | Atomic layer deposition of functional multicomponent oxides |
| title_full | Atomic layer deposition of functional multicomponent oxides |
| title_fullStr | Atomic layer deposition of functional multicomponent oxides |
| title_full_unstemmed | Atomic layer deposition of functional multicomponent oxides |
| title_short | Atomic layer deposition of functional multicomponent oxides |
| title_sort | atomic layer deposition of functional multicomponent oxides |
| url | http://dx.doi.org/10.1063/1.5113656 |
| work_keys_str_mv | AT marionacoll atomiclayerdepositionoffunctionalmulticomponentoxides AT marinapari atomiclayerdepositionoffunctionalmulticomponentoxides |