Many-Tier Vertical Gate-All-Around Nanowire FET Standard Cell Synthesis for Advanced Technology Nodes
Many-tier vertical gate-all-around nanowire FET (VFET) synthesis strongly demands a holistic approach of modeling/formulating/optimizing transistor placement and in-cell routing to obtain the maximum-achievable power, performance, area, and cost (PPAC) benefits. In this article, we propose a novel s...
Main Authors: | Daeyeal Lee, Chia-Tung Ho, Ilgweon Kang, Sicun Gao, Bill Lin, Chung-Kuan Cheng |
---|---|
Format: | Article |
Language: | English |
Published: |
IEEE
2021-01-01
|
Series: | IEEE Journal on Exploratory Solid-State Computational Devices and Circuits |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/9454552/ |
Similar Items
-
Comparison of Various Factors Affected TID Tolerance in FinFET and Nanowire FET
by: Hyeonjae Won, et al.
Published: (2019-08-01) -
TID Circuit Simulation in Nanowire FETs and Nanosheet FETs
by: Jongwon Lee, et al.
Published: (2021-04-01) -
Comparison of Temperature Dependent Carrier Transport in FinFET and Gate-All-Around Nanowire FET
by: Soohyun Kim, et al.
Published: (2020-04-01) -
Analytical Current–Voltage Modeling and Analysis of the MFIS Gate-All-Around Transistor Featuring Negative-Capacitance
by: Yeji Kim, et al.
Published: (2021-05-01) -
Investigation of Source/Drain Recess Engineering and Its Impacts on FinFET and GAA Nanosheet FET at 5 nm Node
by: Dawei Wang, et al.
Published: (2023-02-01)