Study of Defects and Nano-patterned Substrate Regulation Mechanism in AlN Epilayers

Study of Defects and Nano-patterned Substrate Regulation Mechanism in AlN Epilayers

The high crystal quality and low dislocation densities of aluminum nitride (AlN) grown on flat and nano-patterned sapphire substrate that are synthesized by the metal-organic chemical vapor deposition (MOCVD) method are essential for the realization of high-efficiency deep ultraviolet light-emitting...

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Bibliographic Details
Main Authors: Wenwang Wei, Yi Peng, Yanlian Yang, Kai Xiao, Mudassar Maraj, Jia Yang, Yukun Wang, Wenhong Sun
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Nanomaterials
Subjects:
nano-patterned
AlN
dislocation densities
etch pit density
Online Access:https://www.mdpi.com/2079-4991/12/22/3937

Internet

https://www.mdpi.com/2079-4991/12/22/3937

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