Device Design Guidelines of 3-nm Node Complementary FET (CFET) in Perspective of Electrothermal Characteristics
For the first time, device design guidelines for a 3-nm node complementary field-effect transistor (CFET), which vertically stacks n-type and p-type nanosheet MOSFETs with a shared gate, are investigated using calibrated 3-D technology computer-aided design (TCAD). Here, the optimal device dimension...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2022-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9755956/ |