Optimizing the Thickness Uniformity of Magnetron Sputtering Deposited Films on a Large-Scale Curved Workpiece Surface

Optimizing the Thickness Uniformity of Magnetron Sputtering Deposited Films on a Large-Scale Curved Workpiece Surface

This study prepared magnetron-sputtering deposition film on a large-scale curved workpiece with a favorable thickness uniformity using a rectangular target cathode. For a substrate rotation structure with eccentric rotation/revolution composite motion, the geometrical model of the thickness distribu...

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Bibliographic Details
Main Authors: Zhao JIANG, Zhenlin WANG, Shuilian LUO, Zhanji MA, Yanchun HE, Jiang XU
Format: Article
Language:English
Published: Kaunas University of Technology 2024-01-01
Series:Medžiagotyra
Subjects:
film thickness uniformity
magnetron sputtering
large-scale curved workpiece
simulated calculation
Online Access:https://matsc.ktu.lt/index.php/MatSc/article/view/35103

Internet

https://matsc.ktu.lt/index.php/MatSc/article/view/35103

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