Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis

Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis

ZnO is a remarkable material with many applications in electronics and catalysis. Atomic layer deposition (ALD) of ZnO on flat substrates is an industrially applied and well-known process. Various studies describe the growth of ZnO layers on flat substrates. However, the growth characteristics and r...

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Bibliographic Details
Main Authors: Piyush Ingale, Kristian Knemeyer, Mar Piernavieja Hermida, Raoul Naumann d’Alnoncourt, Arne Thomas, Frank Rosowski
Format: Article
Language:English
Published: MDPI AG 2020-05-01
Series:Nanomaterials
Subjects:
atomic layer deposition
ZnO
high surface area
diethylzinc
SiO<sub>2</sub>
Online Access:https://www.mdpi.com/2079-4991/10/5/981

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https://www.mdpi.com/2079-4991/10/5/981

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