Research progress in formation mechanism of precursor film at high temperatures

Research progress in formation mechanism of precursor film at high temperatures

The formation mechanisms of the precursor film (PF) at high temperature were reviewed, i.e., surface diffusion mechanism, evaporation-condensation mechanism, subcutaneous infiltration mechanism, and rapid absorption then film overflow mechanism. In the experimental metallic systems, the most possibl...

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Bibliographic Details
Main Authors: LIU Lu, ZHU Wenqi, LIN Qiaoli
Format: Article
Language:zho
Published: Journal of Materials Engineering 2022-05-01
Series:Cailiao gongcheng
Subjects:
wettability
wetting foot
wetting halo
diffusing band
Online Access:http://jme.biam.ac.cn/CN/10.11868/j.issn.1001-4381.2021.000277

Internet

http://jme.biam.ac.cn/CN/10.11868/j.issn.1001-4381.2021.000277

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