Research progress in formation mechanism of precursor film at high temperatures
The formation mechanisms of the precursor film (PF) at high temperature were reviewed, i.e., surface diffusion mechanism, evaporation-condensation mechanism, subcutaneous infiltration mechanism, and rapid absorption then film overflow mechanism. In the experimental metallic systems, the most possibl...
Main Authors: | LIU Lu, ZHU Wenqi, LIN Qiaoli |
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Format: | Article |
Language: | zho |
Published: |
Journal of Materials Engineering
2022-05-01
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Series: | Cailiao gongcheng |
Subjects: | |
Online Access: | http://jme.biam.ac.cn/CN/10.11868/j.issn.1001-4381.2021.000277 |
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