Deformation mechanism of metastable oriented grains in high-purity tantalum under different strain paths
High-purity tantalum is used as the sputtering target material for integrated circuits, requiring fine grains and random texture. Understanding different orientation deformation mechanisms, especially the metastable orientation (here {112} crystallographic orientations), is beneficial for controllin...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-05-01
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| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785424010299 |