Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

Low loss silicon waveguides and grating couplers fabricated using anisotropic wet etching technique

We report low-loss silicon waveguides and efficient grating coupler to couple light into them. By using anisotropic wet etching technique, we reduced the side wall roughness down to 1.2nm. The waveguides were patterned along the [112] direction on a [110] SOI substrate. The waveguide boundaries are...

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Dettagli Bibliografici
Autori principali: Kapil eDebnath, Hideo eArimoto, Muhammad K. Husain, Alyssa ePrasmusinto, Abdelrahman eAl-Attili, Rafidah ePetra, Harold M H Chong, Graham Trevor Reed, Shinichi eSaito
Natura: Articolo
Lingua:English
Pubblicazione: Frontiers Media S.A. 2016-02-01
Serie:Frontiers in Materials
Soggetti:
silicon photonics
integrated photonics
Waveguide
Grating coupler
Anisotropic wet etching
Accesso online:http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00010/full

Accesso online

http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00010/full

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