A Method for Wafer Defect Detection Using Spatial Feature Points Guided Affine Iterative Closest Point Algorithm
In integrated circuit manufacturing industry, in order to meet the high demand of electronic products, wafers are designed to be smaller and smaller, which makes automatic wafer defect detection a great challenge. The existing wafer defect detection methods are mainly based on the precise segmentati...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2020-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9078806/ |