Magnetic characteristics of LaMnO3+δ thin films deposited by RF magnetron sputtering in an O2/Ar mixture gas

Magnetic characteristics of LaMnO3+δ thin films deposited by RF magnetron sputtering in an O2/Ar mixture gas

In this work, LaMnO _3+ _δ thin films have been successfully fabricated by RF magnetron sputtering using different O _2 /Ar flux ratios. The crystal structures, morphologies, stoichiometry, surface chemical states and magnetic properties of films are thoroughly characterized by x-ray powder diffract...

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Bibliographic Details
Main Authors: Chen Yufeng, Geming Wang, Sun Zhengfeng, Wang Shenggao, Mao Yangwu, Deng Quanrong, Yang Jingjing
Format: Article
Language:English
Published: IOP Publishing 2021-01-01
Series:Materials Research Express
Subjects:
LaMnO3+δ
RF magnetron sputtering
magnetic characteristics
Online Access:https://doi.org/10.1088/2053-1591/abd6a3

Internet

https://doi.org/10.1088/2053-1591/abd6a3

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