Research on AlN thin film microstructure processing technology based on ultra-thin cantilever beam structure

Aiming at the problem of poor solution selection ratio when the AlN film and porous silicon sacrificial layer are released in the ultra-thin cantilever structure and at the problem of large surface roughness after AlN graphing, the wet corrosion process parameters were optimized, and the influence o...

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Bibliographic Details
Main Authors: Yingqi Shang, Hongquan Zhang, Weiwei Liu, Dongsa Chen, Shuangyu Wu, Zuofei Wu
Format: Article
Language:English
Published: AIP Publishing LLC 2023-03-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0132910