Hollow Cathode Gas Flow Sputtering of Nickel Oxide Thin Films for Hole‐Transport Layer Application in Perovskite Solar Cells

Hollow Cathode Gas Flow Sputtering of Nickel Oxide Thin Films for Hole‐Transport Layer Application in Perovskite Solar Cells

Nickel oxide (NiO1+δ) is a versatile material used in various fields such as optoelectronics, spintronics, electrochemistry, and catalysis which is prepared with a wide range of deposition methods. Herein, for the deposition of NiO1+δ films, the reactive gas flow sputtering (GFS) process using a met...

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Bibliographic Details
Main Authors: Sri Hari Bharath Vinoth Kumar, Ruslan Muydinov, Natalia Maticiuc, Nivin Alktash, Marin Rusu, Bertwin Bilgrim Otto Seibertz, Hans Köbler, Antonio Abate, Thomas Unold, Iver Lauermann, Bernd Szyszka
Format: Article
Language:English
Published: Wiley-VCH 2024-04-01
Series:Advanced Energy & Sustainability Research
Subjects:
gas flow sputtering
hollow cathode
hybrid perovskite solar cells
nickel oxide
p‐type transparent conducting oxides (TCO)
Online Access:https://doi.org/10.1002/aesr.202300201

Internet

https://doi.org/10.1002/aesr.202300201

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