Impact of Ar Flow Rates on Micro-Structural Properties of WS<sub>2</sub> Thin Film by RF Magnetron Sputtering

Impact of Ar Flow Rates on Micro-Structural Properties of WS<sub>2</sub> Thin Film by RF Magnetron Sputtering

Tungsten disulfide (WS<sub>2</sub>) thin films were deposited on soda-lime glass (SLG) substrates using radio frequency (RF) magnetron sputtering at different Ar flow rates (3 to 7 sccm). The effect of Ar flow rates on the structural, morphology, and electrical properties of the WS<su...

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Bibliographic Details
Main Authors: Md. Akhtaruzzaman, Md. Shahiduzzaman, Nowshad Amin, Ghulam Muhammad, Mohammad Aminul Islam, Khan Sobayel Bin Rafiq, Kamaruzzaman Sopian
Format: Article
Language:English
Published: MDPI AG 2021-06-01
Series:Nanomaterials
Subjects:
tungsten disulfide (WS<sub>2</sub>)
thin film
radio frequency magnetron sputtering
gas flow rate
defect engineering
Online Access:https://www.mdpi.com/2079-4991/11/7/1635

Internet

https://www.mdpi.com/2079-4991/11/7/1635

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