Strategic analysis of innovative laser interference lithography technology using claim-based patent informatics

Strategic analysis of innovative laser interference lithography technology using claim-based patent informatics

Patent analysis depicts the innovative directions of research and development (R&D) and technical breakthroughs in given domains, because patents are effective means of intellectual property right (IPR) protection for innovations with viable commercial applications. Patent analysis often helps c...

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Bibliographic Details
Main Authors: Chia-Wei Jui, Amy J.C. Trappey, Chien-Chung Fu
Format: Article
Language:English
Published: Taylor & Francis Group 2016-12-01
Series:Cogent Engineering
Subjects:
patent analysis
laser interference lithography (lil)
claim based technology analysis
patent clustering
independent claim
patent search
innovative design and manufacturing
Online Access:http://dx.doi.org/10.1080/23311916.2016.1240054

Internet

http://dx.doi.org/10.1080/23311916.2016.1240054

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