TEM Image Analysis and Simulation Physics for Two-Step Recrystallization of Discretely Amorphized C<sub>3</sub>H<sub>5</sub>-Molecular-Ion-Implanted Silicon Substrate Surface
In this study, we investigate the initial rapid recrystallization of a discretely amorphized C<sub>3</sub>H<sub>5</sub>-molecular-ion-implanted silicon (Si) substrate surface in the subsequent thermal annealing treatment through the analysis of plan-view transmission electron...
Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2024-01-01
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Series: | Crystals |
Subjects: | |
Online Access: | https://www.mdpi.com/2073-4352/14/2/112 |