Modification of stearic acid in Ar and Ar-O2 pulsed DC discharge

Modification of stearic acid in Ar and Ar-O2 pulsed DC discharge

Stearic acid (CH3(CH2)16COOH) was treated with Ar and Ar-O2 (10%) pulsed DC discharges created by a cathode-anode confined system to elucidate the role of oxygen in plasma cleaning. The treatment time (5 to 120 minutes) and plasma gas mixture (Ar and Ar-O2) were varied, and the results showed that t...

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Bibliographic Details
Main Authors: Euclides Alexandre Bernardelli, Thiago Souza, Márcio Mafra, Ana Maria Maliska, Thierry Belmonte, Aloisio Nelmo Klein
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2011-12-01
Series:Materials Research
Subjects:
stearic acid
grafting
etching
cleaning by plasma
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392011000400016

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http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392011000400016

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