Growth of centimeter-scale atomically thin MoS2 films by pulsed laser deposition
We are reporting the growth of single layer and few-layer MoS2 films on single crystal sapphire substrates using a pulsed-laser deposition technique. A pulsed KrF excimer laser (wavelength: 248 nm; pulse width: 25 ns) was used to ablate a polycrystalline MoS2 target. The material thus ablated was de...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2015-05-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.4921580 |