Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region
It has been observed that modifications of non-metallic solids such as sputtering and surface morphology are induced by electronic excitation under high-energy ion impact and that these modifications depend on the charge of incident ions (charge-state effect or incident-charge effect). A simple mode...
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MDPI AG
2021-06-01
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| author | Noriaki Matsunami Masao Sataka Satoru Okayasu Bun Tsuchiya |
| author_facet | Noriaki Matsunami Masao Sataka Satoru Okayasu Bun Tsuchiya |
| author_sort | Noriaki Matsunami |
| collection | DOAJ |
| description | It has been observed that modifications of non-metallic solids such as sputtering and surface morphology are induced by electronic excitation under high-energy ion impact and that these modifications depend on the charge of incident ions (charge-state effect or incident-charge effect). A simple model is described, consisting of an approximation to the mean-charge-evolution by saturation curves and the charge-dependent electronic stopping power, for the evaluation of the relative yield (e.g., electronic sputtering yield) of the non-equilibrium charge incidence over that of the equilibrium-charge incidence. It is found that the present model reasonably explains the charge state effect on the film thickness dependence of lattice disordering of WO<sub>3</sub>. On the other hand, the model appears to be inadequate to explain the charge-state effect on the electronic sputtering of WO<sub>3</sub> and LiF. Brief descriptions are given for the charge-state effect on the electronic sputtering of SiO<sub>2</sub>, UO<sub>2</sub> and UF<sub>4</sub>, and surface morphology modification of poly-methyl-methacrylate (PMMA), mica and tetrahedral amorphous carbon (ta-C). |
| first_indexed | 2024-03-10T10:06:46Z |
| format | Article |
| id | doaj.art-aabbebd4c3ca49c2bc223c0c8b3356c6 |
| institution | Directory Open Access Journal |
| issn | 2218-2004 |
| language | English |
| last_indexed | 2024-03-10T10:06:46Z |
| publishDate | 2021-06-01 |
| publisher | MDPI AG |
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| spelling | doaj.art-aabbebd4c3ca49c2bc223c0c8b3356c62023-11-22T01:28:38ZengMDPI AGAtoms2218-20042021-06-01933610.3390/atoms9030036Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping RegionNoriaki Matsunami0Masao Sataka1Satoru Okayasu2Bun Tsuchiya3Faculty of Science and Technology, Meijo University, Nagoya 468-8502, JapanJapan Atomic Energy Agency (JAEA), Tokai 319-1195, JapanJapan Atomic Energy Agency (JAEA), Tokai 319-1195, JapanFaculty of Science and Technology, Meijo University, Nagoya 468-8502, JapanIt has been observed that modifications of non-metallic solids such as sputtering and surface morphology are induced by electronic excitation under high-energy ion impact and that these modifications depend on the charge of incident ions (charge-state effect or incident-charge effect). A simple model is described, consisting of an approximation to the mean-charge-evolution by saturation curves and the charge-dependent electronic stopping power, for the evaluation of the relative yield (e.g., electronic sputtering yield) of the non-equilibrium charge incidence over that of the equilibrium-charge incidence. It is found that the present model reasonably explains the charge state effect on the film thickness dependence of lattice disordering of WO<sub>3</sub>. On the other hand, the model appears to be inadequate to explain the charge-state effect on the electronic sputtering of WO<sub>3</sub> and LiF. Brief descriptions are given for the charge-state effect on the electronic sputtering of SiO<sub>2</sub>, UO<sub>2</sub> and UF<sub>4</sub>, and surface morphology modification of poly-methyl-methacrylate (PMMA), mica and tetrahedral amorphous carbon (ta-C).https://www.mdpi.com/2218-2004/9/3/36charge-state effectelectronic excitation effecthigh-energy ionnon-metallic solidmean-charge evolutionsputtering |
| spellingShingle | Noriaki Matsunami Masao Sataka Satoru Okayasu Bun Tsuchiya Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region Atoms charge-state effect electronic excitation effect high-energy ion non-metallic solid mean-charge evolution sputtering |
| title | Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region |
| title_full | Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region |
| title_fullStr | Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region |
| title_full_unstemmed | Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region |
| title_short | Charge State Effect of High Energy Ions on Material Modification in the Electronic Stopping Region |
| title_sort | charge state effect of high energy ions on material modification in the electronic stopping region |
| topic | charge-state effect electronic excitation effect high-energy ion non-metallic solid mean-charge evolution sputtering |
| url | https://www.mdpi.com/2218-2004/9/3/36 |
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