Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering

Enhanced Electrical Properties of Copper Nitride Films Deposited via High Power Impulse Magnetron Sputtering

High Power Impulse Magnetron Sputtering (HiPIMS) has generated a great deal of interest by offering significant advantages such as high target ionization rate, high plasma density, and the smooth surface of the sputtered films. This study discusses the deposition of copper nitride thin films via HiP...

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Bibliographic Details
Main Authors: Yin-Hung Chen, Pei-Ing Lee, Shikha Sakalley, Chao-Kuang Wen, Wei-Chun Cheng, Hui Sun, Sheng-Chi Chen
Format: Article
Language:English
Published: MDPI AG 2022-08-01
Series:Nanomaterials
Subjects:
copper nitride (Cu<sub>3</sub>N) thin films
High Power Impulse Magnetron Sputtering (HiPIMS)
peak power density
deposition pressure
conductivity type
Online Access:https://www.mdpi.com/2079-4991/12/16/2814

Internet

https://www.mdpi.com/2079-4991/12/16/2814

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