The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer

A high aluminum (Al) content <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film was synthesized on c-plane sapphire substrate using the gallium (Ga) diffusion method. The obtained <i>β</i>-(Al<sub>x<...

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Main Authors: Wenhui Zhang, Hezhi Zhang, Song Zhang, Zishi Wang, Litao Liu, Qi Zhang, Xibing Hu, Hongwei Liang
Format: Article
Language:English
Published: MDPI AG 2023-03-01
Series:Materials
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Online Access:https://www.mdpi.com/1996-1944/16/7/2775
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author Wenhui Zhang
Hezhi Zhang
Song Zhang
Zishi Wang
Litao Liu
Qi Zhang
Xibing Hu
Hongwei Liang
author_facet Wenhui Zhang
Hezhi Zhang
Song Zhang
Zishi Wang
Litao Liu
Qi Zhang
Xibing Hu
Hongwei Liang
author_sort Wenhui Zhang
collection DOAJ
description A high aluminum (Al) content <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film was synthesized on c-plane sapphire substrate using the gallium (Ga) diffusion method. The obtained <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film had an average thickness of 750 nm and a surface roughness of 2.10 nm. Secondary ion mass spectrometry results indicated the homogenous distribution of Al components in the film. The Al compositions in the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, as estimated by X-ray diffraction, were close to those estimated by X-ray photoelectron spectroscopy, at ~62% and ~61.5%, respectively. The bandgap of the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, extracted from the O 1s core-level spectra, was approximately 6.0 ± 0.1 eV. After synthesizing the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, a thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> film was further deposited on sapphire substrate using carbothermal reduction and halide vapor phase epitaxy. The <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film, grown on a sapphire substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> buffer layer, exhibited improved crystal orientation along the (-201) plane. Moreover, the scanning electron microscopy revealed that the surface quality of the <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film on sapphire substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> intermediate buffer layer was significantly improved, with an obvious transition from grain island-like morphology to 2D continuous growth, and a reduction in surface roughness to less than 10 nm.
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spelling doaj.art-acef929fed2b43dabff3d0203ba727d42023-11-17T17:04:55ZengMDPI AGMaterials1996-19442023-03-01167277510.3390/ma16072775The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer LayerWenhui Zhang0Hezhi Zhang1Song Zhang2Zishi Wang3Litao Liu4Qi Zhang5Xibing Hu6Hongwei Liang7School of Microeletronics, Dalian University of Technology, Dalian 116024, ChinaSchool of Microeletronics, Dalian University of Technology, Dalian 116024, ChinaThe 46th Research Institute of China Electronics Technology Group Corporation, Tianjin 300220, ChinaSchool of Microeletronics, Dalian University of Technology, Dalian 116024, ChinaSchool of Microeletronics, Dalian University of Technology, Dalian 116024, ChinaJiangsu Xinguanglian Technology Company Co., Ltd., Wuxi 214192, ChinaJiangsu Xinguanglian Technology Company Co., Ltd., Wuxi 214192, ChinaSchool of Microeletronics, Dalian University of Technology, Dalian 116024, ChinaA high aluminum (Al) content <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film was synthesized on c-plane sapphire substrate using the gallium (Ga) diffusion method. The obtained <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film had an average thickness of 750 nm and a surface roughness of 2.10 nm. Secondary ion mass spectrometry results indicated the homogenous distribution of Al components in the film. The Al compositions in the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, as estimated by X-ray diffraction, were close to those estimated by X-ray photoelectron spectroscopy, at ~62% and ~61.5%, respectively. The bandgap of the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, extracted from the O 1s core-level spectra, was approximately 6.0 ± 0.1 eV. After synthesizing the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> film, a thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> film was further deposited on sapphire substrate using carbothermal reduction and halide vapor phase epitaxy. The <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film, grown on a sapphire substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> buffer layer, exhibited improved crystal orientation along the (-201) plane. Moreover, the scanning electron microscopy revealed that the surface quality of the <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film on sapphire substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> intermediate buffer layer was significantly improved, with an obvious transition from grain island-like morphology to 2D continuous growth, and a reduction in surface roughness to less than 10 nm.https://www.mdpi.com/1996-1944/16/7/2775<i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> buffer layer<i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick filmheteroepitaxy
spellingShingle Wenhui Zhang
Hezhi Zhang
Song Zhang
Zishi Wang
Litao Liu
Qi Zhang
Xibing Hu
Hongwei Liang
The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
Materials
<i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> buffer layer
<i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film
heteroepitaxy
title The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
title_full The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
title_fullStr The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
title_full_unstemmed The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
title_short The Heteroepitaxy of Thick <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> Film on Sapphire Substrate with a <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> Intermediate Buffer Layer
title_sort heteroepitaxy of thick i β i ga sub 2 sub o sub 3 sub film on sapphire substrate with a i β i al sub x sub ga sub 1 x sub sub 2 sub o sub 3 sub intermediate buffer layer
topic <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> buffer layer
<i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thick film
heteroepitaxy
url https://www.mdpi.com/1996-1944/16/7/2775
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