Functional polymeric passivation-led improvement of bias stress with long-term durability of edge-rich nanoporous MoS2 thin-film transistors
Abstract Nanoporous patterning of two-dimensional materials using block copolymer lithography has drawn much attention. Lateral edge exposures made by the nanoporous patterning provide electrical and optical characteristics that are different from the original materials. However, nanopatterning proc...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2022-03-01
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| Series: | npj 2D Materials and Applications |
| Online Access: | https://doi.org/10.1038/s41699-022-00296-7 |