Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer
In wavelength-tuning interferometry, the surface profile of the optical component is a key evaluation index. However, the systematic errors caused by the coupling error between the higher harmonics and phase shift error are considerable. In this research, a new 10<i>N</i> − 9 phase-shift...
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MDPI AG
2020-05-01
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author | Fuqing Miao Seokyoung Ahn Yangjin Kim |
author_facet | Fuqing Miao Seokyoung Ahn Yangjin Kim |
author_sort | Fuqing Miao |
collection | DOAJ |
description | In wavelength-tuning interferometry, the surface profile of the optical component is a key evaluation index. However, the systematic errors caused by the coupling error between the higher harmonics and phase shift error are considerable. In this research, a new 10<i>N</i> − 9 phase-shifting algorithm comprising a new polynomial window function and a DFT is developed. A new polynomial window function is developed based on characteristic polynomial theory. The characteristic of the new 10<i>N</i> − 9 algorithm is represented in the frequency domain by Fourier description. The phase error of the new algorithm is also discussed and compared with other phase-shifting algorithms. The surface profile of a silicon wafer was measured by using the 10<i>N</i> − 9 algorithm and a wavelength-tuning interferometer. The repeatability measurement error across 20 experiments was 2.045 nm, which indicates that the new 10<i>N</i> − 9 algorithm outperforms the conventional phase-shifting algorithm. |
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spelling | doaj.art-ae7b1ad728474e2c8965336e02d56fa32023-11-19T23:41:45ZengMDPI AGApplied Sciences2076-34172020-05-01109325010.3390/app10093250Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning InterferometerFuqing Miao0Seokyoung Ahn1Yangjin Kim2School of Mechanical Engineering, Pusan National University, Busan 46241, KoreaSchool of Mechanical Engineering, Pusan National University, Busan 46241, KoreaSchool of Mechanical Engineering, Pusan National University, Busan 46241, KoreaIn wavelength-tuning interferometry, the surface profile of the optical component is a key evaluation index. However, the systematic errors caused by the coupling error between the higher harmonics and phase shift error are considerable. In this research, a new 10<i>N</i> − 9 phase-shifting algorithm comprising a new polynomial window function and a DFT is developed. A new polynomial window function is developed based on characteristic polynomial theory. The characteristic of the new 10<i>N</i> − 9 algorithm is represented in the frequency domain by Fourier description. The phase error of the new algorithm is also discussed and compared with other phase-shifting algorithms. The surface profile of a silicon wafer was measured by using the 10<i>N</i> − 9 algorithm and a wavelength-tuning interferometer. The repeatability measurement error across 20 experiments was 2.045 nm, which indicates that the new 10<i>N</i> − 9 algorithm outperforms the conventional phase-shifting algorithm.https://www.mdpi.com/2076-3417/10/9/3250fringe analysisinterferometrysurface shapewavelength tuningphase errornondestructive testing |
spellingShingle | Fuqing Miao Seokyoung Ahn Yangjin Kim Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer Applied Sciences fringe analysis interferometry surface shape wavelength tuning phase error nondestructive testing |
title | Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer |
title_full | Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer |
title_fullStr | Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer |
title_full_unstemmed | Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer |
title_short | Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer |
title_sort | precise measurement of the surface shape of silicon wafer by using a new phase shifting algorithm and wavelength tuning interferometer |
topic | fringe analysis interferometry surface shape wavelength tuning phase error nondestructive testing |
url | https://www.mdpi.com/2076-3417/10/9/3250 |
work_keys_str_mv | AT fuqingmiao precisemeasurementofthesurfaceshapeofsiliconwaferbyusinganewphaseshiftingalgorithmandwavelengthtuninginterferometer AT seokyoungahn precisemeasurementofthesurfaceshapeofsiliconwaferbyusinganewphaseshiftingalgorithmandwavelengthtuninginterferometer AT yangjinkim precisemeasurementofthesurfaceshapeofsiliconwaferbyusinganewphaseshiftingalgorithmandwavelengthtuninginterferometer |