Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists

Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists

Non-oxide ceramic MEMS based on Si, C, N and B elements are of great importance for high-temperature applications in harsh and oxidizing conditions including electronics, photonics and actuators. Yet, structuring and patterning ceramics is challenging and often relies on conventional soft-lithograph...

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Bibliographic Details
Main Authors: Quentin Hanniet, Eddy Petit, Sylvie Calas-Etienne, Pascal Etienne, Karim Aissou, Christel Gervais, Philippe Miele, Benoit Charlot, Chrystelle Salameh
Format: Article
Language:English
Published: Elsevier 2022-11-01
Series:Materials & Design
Subjects:
Preceramic photoresists
SiBCN
Photolithography
MEMS
Online Access:http://www.sciencedirect.com/science/article/pii/S0264127522008565

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http://www.sciencedirect.com/science/article/pii/S0264127522008565

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