Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists
Non-oxide ceramic MEMS based on Si, C, N and B elements are of great importance for high-temperature applications in harsh and oxidizing conditions including electronics, photonics and actuators. Yet, structuring and patterning ceramics is challenging and often relies on conventional soft-lithograph...
| Main Authors: | , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2022-11-01
|
| Series: | Materials & Design |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S0264127522008565 |
| _version_ | 1797990315015012352 |
|---|---|
| author | Quentin Hanniet Eddy Petit Sylvie Calas-Etienne Pascal Etienne Karim Aissou Christel Gervais Philippe Miele Benoit Charlot Chrystelle Salameh |
| author_facet | Quentin Hanniet Eddy Petit Sylvie Calas-Etienne Pascal Etienne Karim Aissou Christel Gervais Philippe Miele Benoit Charlot Chrystelle Salameh |
| author_sort | Quentin Hanniet |
| collection | DOAJ |
| description | Non-oxide ceramic MEMS based on Si, C, N and B elements are of great importance for high-temperature applications in harsh and oxidizing conditions including electronics, photonics and actuators. Yet, structuring and patterning ceramics is challenging and often relies on conventional soft-lithography or molding processes that can introduce defects and cracks leading to a decrease in the device’s performance. Herein, we report on the design for the first time of SiBCN ceramic micro-components (in the 20–200 µm range) from direct patterning of “tailor-made” UV-curable boron-modified polyvinylsilazane preceramic (polyborovinylsilazane) resins. This approach first involves a two-step chemical synthesis of patternable preceramic polymers through acrylate or methacrylate grafting onto polyborovinylsilazane followed by subsequent crosslinking under UV light. FTIR and NMR spectroscopies confirmed the successful grafting of boron and photocurable units on the preceramic polymers while thermogravimetric analysis was used to monitor the polymer-to-ceramic conversion. SiBCN micro-objects obtained after pyrolysis were thoroughly characterized by SEM, AFM, nanoindentation and profilometry techniques. The Young’s modulus results for such microstructures (∼60 GPa) are characteristic of good mechanical properties making these ceramic microstructures promising materials for MEMS applications. |
| first_indexed | 2024-04-11T08:34:42Z |
| format | Article |
| id | doaj.art-af2314798d794019b7dd510589759381 |
| institution | Directory Open Access Journal |
| issn | 0264-1275 |
| language | English |
| last_indexed | 2024-04-11T08:34:42Z |
| publishDate | 2022-11-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Materials & Design |
| spelling | doaj.art-af2314798d794019b7dd5105897593812022-12-22T04:34:23ZengElsevierMaterials & Design0264-12752022-11-01223111234Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresistsQuentin Hanniet0Eddy Petit1Sylvie Calas-Etienne2Pascal Etienne3Karim Aissou4Christel Gervais5Philippe Miele6Benoit Charlot7Chrystelle Salameh8Institut Européen des Membranes, IEM, UMR 5635, Univ Montpellier, ENSCM, CNRS, Montpellier, FranceInstitut Européen des Membranes, IEM, UMR 5635, Univ Montpellier, ENSCM, CNRS, Montpellier, FranceLaboratoire Charles Coulomb, UMR 5221 CNRS, Université de Montpellier, 34095 Montpellier, FranceLaboratoire Charles Coulomb, UMR 5221 CNRS, Université de Montpellier, 34095 Montpellier, FranceInstitut Européen des Membranes, IEM, UMR 5635, Univ Montpellier, ENSCM, CNRS, Montpellier, FranceSorbonne Université, UMR 7574 CNRS, Laboratoire de Chimie de la Matière Condensée de Paris, LCMCP, F-75005 Paris, FranceInstitut Européen des Membranes, IEM, UMR 5635, Univ Montpellier, ENSCM, CNRS, Montpellier, FranceInstitut d’Électronique et des Systèmes, UMR 5214 CNRS, University of Montpellier, Montpellier, FranceInstitut Européen des Membranes, IEM, UMR 5635, Univ Montpellier, ENSCM, CNRS, Montpellier, France; Corresponding author.Non-oxide ceramic MEMS based on Si, C, N and B elements are of great importance for high-temperature applications in harsh and oxidizing conditions including electronics, photonics and actuators. Yet, structuring and patterning ceramics is challenging and often relies on conventional soft-lithography or molding processes that can introduce defects and cracks leading to a decrease in the device’s performance. Herein, we report on the design for the first time of SiBCN ceramic micro-components (in the 20–200 µm range) from direct patterning of “tailor-made” UV-curable boron-modified polyvinylsilazane preceramic (polyborovinylsilazane) resins. This approach first involves a two-step chemical synthesis of patternable preceramic polymers through acrylate or methacrylate grafting onto polyborovinylsilazane followed by subsequent crosslinking under UV light. FTIR and NMR spectroscopies confirmed the successful grafting of boron and photocurable units on the preceramic polymers while thermogravimetric analysis was used to monitor the polymer-to-ceramic conversion. SiBCN micro-objects obtained after pyrolysis were thoroughly characterized by SEM, AFM, nanoindentation and profilometry techniques. The Young’s modulus results for such microstructures (∼60 GPa) are characteristic of good mechanical properties making these ceramic microstructures promising materials for MEMS applications.http://www.sciencedirect.com/science/article/pii/S0264127522008565Preceramic photoresistsSiBCNPhotolithographyMEMS |
| spellingShingle | Quentin Hanniet Eddy Petit Sylvie Calas-Etienne Pascal Etienne Karim Aissou Christel Gervais Philippe Miele Benoit Charlot Chrystelle Salameh Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists Materials & Design Preceramic photoresists SiBCN Photolithography MEMS |
| title | Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists |
| title_full | Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists |
| title_fullStr | Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists |
| title_full_unstemmed | Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists |
| title_short | Rational design of SiBCN microstructures using direct photolithography of patternable preceramic photoresists |
| title_sort | rational design of sibcn microstructures using direct photolithography of patternable preceramic photoresists |
| topic | Preceramic photoresists SiBCN Photolithography MEMS |
| url | http://www.sciencedirect.com/science/article/pii/S0264127522008565 |
| work_keys_str_mv | AT quentinhanniet rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT eddypetit rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT sylviecalasetienne rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT pascaletienne rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT karimaissou rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT christelgervais rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT philippemiele rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT benoitcharlot rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists AT chrystellesalameh rationaldesignofsibcnmicrostructuresusingdirectphotolithographyofpatternablepreceramicphotoresists |