Edge lithography based on aluminum dry etching
Traditional nanolithography methods, such as electron beam or ion beam lithography, can be expensive and slow, limiting their applications. Edge lithography offers a promising alternative for efficiently and effectively creating nanoscale patterns using lower-cost lithography equipment with higher t...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-03-01
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| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007223000631 |