Role of Critical Processing Parameters on Fundamental Phenomena and Characterizations of DC Argon Glow Discharge
Given the significance of carefully analyzingthe critical range for processing parameters in asputtering system prior to experiments, as well as theireffect on the quality of the deposited thin film, thiscrucial subject has been simulated and researched in thisresearch. Argon glow discharge conditio...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Islamic Azad University, Marvdasht Branch
2022-08-01
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| Series: | Journal of Optoelectronical Nanostructures |
| Subjects: | |
| Online Access: | https://jopn.marvdasht.iau.ir/article_5338_0bd5128b2332039821e9dafb7f0fa40b.pdf |