High conductivity of n-type β-Ga2O3(010) thin films achieved through Si doping by mist chemical vapor deposition

Currently, β-Ga2O3 has attracted significant attention as a wide bandgap semiconductor, and numerous growth techniques are being explored to control its carrier concentration for various applications. In this study, we investigated the homoepitaxial growth of Si-doped β-Ga2O3 thin films on a Fe-dope...

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Bibliographic Details
Main Authors: Shoma Hosaka, Hiroyuki Nishinaka, Temma Ogawa, Hiroki Miyake, Masahiro Yoshimoto
Format: Article
Language:English
Published: AIP Publishing LLC 2024-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0182448