Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

Nanostructures of 4-(chloromethyl)phenyltrichlorosilane (CMPS) were used as a foundation to attach and grow heterostructures of porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of...

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Bibliographic Details
Main Authors: Phillip C. Chambers, Jayne C. Garno
Format: Article
Language:English
Published: Beilstein-Institut 2018-04-01
Series:Beilstein Journal of Nanotechnology
Subjects:
atomic force microscopy (AFM)
nanostructures
particle lithography
porphyrin
self-assembly
Online Access:https://doi.org/10.3762/bjnano.9.112

Internet

https://doi.org/10.3762/bjnano.9.112

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