Controlling the sharpness of room-temperature metal-insulator transition in epitaxial Sm0.5Nd0.5NiO3 films

Controlling the sharpness of room-temperature metal-insulator transition in epitaxial Sm0.5Nd0.5NiO3 films

Sm0.5Nd0.5NiO3 (SNNO) films with metal-insulator transition (MIT) at room-temperature (∼300 K) have been grown on NdGaO3 (001) substrates by pulsed laser deposition. By modifying the parameters of oxygen pressure, substrate temperature, and film thickness, the role of oxygen vacancies and strain rel...

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Bibliographic Details
Main Authors: X. K. Lian, F. Chen, X. L. Tan, L. F. Wang, X. F. Xuan, G. Y. Gao, S. W. Jin, W. B. Wu
Format: Article
Language:English
Published: AIP Publishing LLC 2013-06-01
Series:AIP Advances
Online Access:http://link.aip.org/link/doi/10.1063/1.4812716

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http://link.aip.org/link/doi/10.1063/1.4812716

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