Evolution of surface morphology and properties of diamond films by hydrogen plasma etching

The micron-scale diamond film was prepared using hydrogen and methane as the mixed gas supplies via self-developed 3 kW/2,450 MHz microwave plasma chemical vapor deposition (MPCVD) equipment. On this basis, the evolution of the surface morphology, hydrophobicity, and electrical properties of samples...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser: Chu Genjie, Li Sijia, Gao Jiyun, Yang Li, Hou Ming, Guo Shenghui
Format: Artikel
Sprache:English
Veröffentlicht: De Gruyter 2023-01-01
Schriftenreihe:Green Processing and Synthesis
Schlagworte:
Online Zugang:https://doi.org/10.1515/gps-2022-8110