The influences of filament temperature on the structure of boron nitride films and its tribological characterization for microforming die application
Boron nitride film was deposited on 〈1 0 0〉-oriented silicon substrate by hot filament assisted chemical vapor deposition. The B[N(CH3)2]3 (Tris(dimetylamino)borane, TDMAB) was used as the single source precursor both for boron and nitride, and ammonia gas was used as the extra source to increase th...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2015-01-01
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| Series: | Manufacturing Review |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.1051/mfreview/2015007 |