Design and Fabrication of Double-Layer Crossed Si Microchannel Structure
A four-step etching method is used to prepare the double-layer cross Si microchannel structure. In the first etching step, a <100> V-groove structure is etched on (100) silicon, and the top channel is formed after thermal oxidation with the depth of the channel and the slope of its sidewall be...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-12-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/12/12/1557 |