Enhanced thermoelectric performance in K0.87RhO2 thin films induced by changing ambient gases during pulsed laser deposition
K0.87RhO2 thin films were prepared by pulsed laser deposition on fused silica substrates under different ambient gases. Besides the usual forming gas for oxides (i.e., O2), N2, Ar, mixture of O2 + N2, mixture of O2 + Ar, and vacuum were used during deposition. Although the crystal structure remained...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2021-07-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0057299 |